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Energy Saving Magnetron Sputtering Coating Machine For Gold Car Wheel HubIndustrial food and beverage equipment - Atop Industry Company - China - January 15, 2018 - check with company for price
ATOP Car Wheel Hub Magnetron Sputtering PVD Vacuum Coating Machine Main Feature 1. Magnetron sputtering principle is based on the theory of the cathode glow discharge, it expend the cathode surface magnetic field near the work piece surface. Then it ...
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Magnetron Sputtering Ion Chrome Plating Machine For Sanitary Ware AccessoriesIndustrial food and beverage equipment - Atop Industry Company - China - January 15, 2018 - check with company for price
ATOP Sanitary Ware Magnetron Sputtering Ion Chrome Plating PVD Vacuum Coating Machine Main Feature 1. The arc plasma evaporation source is reliable, it can work under 40A current in optimizing the cathode and the magnetic field structure, . It will h...
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Water Faucet Pvd Plating Machine With High Power Impulse Magnetron SputteringIndustrial food and beverage equipment - Atop Industry Company - China - January 15, 2018 - check with company for price
ATOP Water Faucet/Tap Plating Magnetron Sputtering Multi Arc PVD Coating Machine Equipment Configuration Structure type:vertical type or horizontal type Chamber typr:single door or double doors Main Feature 1. The arc plasma evaporation source is rel...
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Titanium Sputtering Target Astm B381Metal and mineral industries - Superbti Co.,Ltd - China - April 5, 2018 - 20.00 Dollar US$
1. Introduction Sputtering targets technology has been used in large area coating manufacturing of architectural glass and flat panel displays. Tubular Targets Rotatable targets Planar sputtering targets 2. Materials & standards Material titanium...
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Tantalum Sputtering TargetMinerals and ores and metals - Baoji Towin Rare Metals Co., Ltd - China - November 7, 2018 - check with company for price
ASTM B708 Standard Tantalum Sputtering Target, 99.95% 3N5 - 99.99% 4N Purity, Disc Target Chemical Compositions: Typical Analysis:Ta 99.95% 3N5 - 99.99%(4N) Metallic impurities, ppm max by weight Element Al Au Ag Bi B Ca Cl Cd Co Cr Cu Fe Content 0.2...
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Niobium Sputtering TargetMinerals and ores and metals - Baoji Towin Rare Metals Co., Ltd - China - November 7, 2018 - check with company for price
Niobium Sputtering Target, Rectangular Target, Planar Targets Purity:Nb 99.95%(3N5)-99.99%(4N) Dimension: Rectangular target, size as per request Manufacturing Standard: ASTM B393 ISO9001 Specification: Customized as per request Products Regular Spec...
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Niobiuim Sputtering TargetMinerals and ores and metals - Baoji Towin Rare Metals Co., Ltd - China - November 7, 2018 - check with company for price
Niobium Sputtering Target, Rotary Targets, 99.95(3N5)-99.99%(4N) Purity - Coating Material ISO9001 Application: Niobium Sputtering Targets are used as coating materials for semiconductors and optics, anticorrosion materials for ships, chemical vessel...
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Niobiuim Sputtering Target Disc RoundMinerals and ores and metals - Baoji Towin Rare Metals Co., Ltd - China - November 7, 2018 - contact company for price
Niobium Sputtering Target, Round Niobium Targets, Disc Niobium Target, 99.95%(3N5) - 99.99%(4N) Purity, Disc Targets, Coating Material Material: Nb 99.95%-99.99% Boiling point: 4742 ℃ Melting point: 2468 ℃ Property: heat-resistant, corrosion resistan...
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Desktop One Target Dc Magnetron Sputtering Coaing MachineLaboratory and scientific equipment - Zhengzhou CY Scientific Instrument Co., Ltd. - China - July 30, 2020 - 10000.00 Dollar US$
Small desktop single-target DC magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It has the characteristics of miniaturization and standardization. The magnetron target head...
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Laboratory Dc Magnetron Sputtering Metal Coating MachineLaboratory and scientific equipment - Zhengzhou CY Scientific Instrument Co., Ltd. - China - July 30, 2020 - 11000.00 Dollar US$
Single target DC magnetron sputtering coater CY-MSP300S-DC is a cost-effective vacuum PVD coating equipment independently developed by our company. It is standardized, modular and customizable. The magnetron target head can be selected from 1 inch 2 ...
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Dual Target Dc Magnetron Co Sputtering Pvd Coating MachineLaboratory and scientific equipment - Zhengzhou CY Scientific Instrument Co., Ltd. - China - July 30, 2020 - contact company for price
Dual-target DC magnetron sputtering coater CY-MSP300S-2DC is a cost-effective vacuum PVD coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to c...
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Two Targets Rf Magnetron Co Sputtering Non Metal Coating MachineLaboratory and scientific equipment - Zhengzhou CY Scientific Instrument Co., Ltd. - China - July 30, 2020 - contact company for price
Dual-target RF magnetron sputtering coater CY-MSP300S-2RF is a cost-effective vacuum PVD coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to c...
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Lab Vacuum Pvd Three Targets Dc Magnetron Co-sputtering Deposition Coating MachineLaboratory and scientific equipment - Zhengzhou CY Scientific Instrument Co., Ltd. - China - July 30, 2020 - contact company for price
Three targets DC magnetron sputtering coater CY-MSP300S-3DC is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets ...
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Magnetron Sputtering SourceIndustrial process machinery - Dongguan Dingshen Tech Co., Ltd. - China - September 12, 2023 - 7500.00 Dollar US$
Features and Benefits Sputtering Width: 1200mm T-S distance: 80-100mm Brush Design: High-purity carbon brush, resistance less than 0.6 Ω, and more stable; Concentricity: Easy change of target with special design of the distal end of the cylindrical t...
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Magnetron Sputtering Source Rotary TubeMachining and processing services - Dongguan Dingshen Tech Co., Ltd. - China - September 12, 2023 - 8000.00 Dollar US$
Rotary magnetron source DST-FEBV1521550 Specifications Target size: ID125mm, OD152mm; Length 1550mm Electrode: M8 studs Cooling Water coupling connector for target: OD19 tower connector x 2pcs (1x in, 1x out) Motor: 200W Single Phase:220V, AC Motor(S...
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Planar Magnetron Sputtering SourceMetal treatment machinery - Dongguan Dingshen Tech Co., Ltd. - China - September 12, 2023 - 15000.00 Dollar US$
Planar magnetron source DST- PMEH100500-AS-AU Specifications Exterior Dimension: 640mmx290mm Target Material Size: 100x500x6mm Electrode: M8 studs Gas Distribution and Connectors: single section distribution, 1/4 inch male coupling connector x2pcs Ga...
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Planar Alloy Sputtering TargetAdvertising - Fujian Acetron New Materials CO. , Ltd - China - March 27, 2024 - contact company for price
Planar Alloy Sputtering Target Excellent properties such as high purity, high density, Good composition uniformity, Uniform grain, etc. High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.W...
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Planar Ceramic Sputtering TargetAdvertising - Fujian Acetron New Materials CO. , Ltd - China - March 27, 2024 - contact company for price
Planar Ceramic Sputtering Target Excellent properties such as high purity, high density, Good microstructure uniformity, excellent electrical properties. High purity: The metal target requires very high purity, to ensure the stability and reliability...
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Planar Metal Sputtering TargetsAdvertising - Fujian Acetron New Materials CO. , Ltd - China - March 27, 2024 - contact company for price
Planar Metal Sputtering Targets Excellent properties such as high purity, high density, high thermal conductivity, high stability, uniform grain, etc. High purity: The metal target requires very high purity, to ensure the stability and reliability of...
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Rotary Metal Sputtering TargetsAdvertising - Fujian Acetron New Materials CO. , Ltd - China - March 27, 2024 - contact company for price
Rotary Metal Sputtering Targets Excellent properties such as high purity, high density, high thermal conductivity, high stability, uniform grain, etc. High purity: The metal target requires very high purity, to ensure the stability and reliability of...