Planar Alloy Sputtering Target - China

Planar Alloy Sputtering Target

Excellent properties such as high purity, high density, Good composition uniformity, Uniform grain, etc.

High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.

We have various purity levels to suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals.

Also have controlled specific impurities within the target

High density: Metal targets have high density characteristics, usually up to 99%, to ensure the stability and quality of materials.

Uniform grain: Controlled grain size and direction

Good composition uniformity: the component distribution is uniform, ensure the film formation rate is uniform, film quality.

* Maximum sizes of planar target

Thickness: 30mm (can be 60mm for round target)

Width: max 2000mm

Length: max 4000mm * Maximum sizes of rotary target

Vacuum/Air Spraying

Backing tubes: ID56 x OD64 x Length300~3000mm, Thickness: 3~5mm

Backing tubes: ID78~83 x OD89~92 x Length300~3000mm, Thickness: 3~7mm

Backing tubes: ID100 x OD108 x Length300~3000mm, Thickness: 3~8mm

Backing tubes: ID125 x OD133 x Length300~4000mm, Thickness: 3~13mm Bonding

Backing tubes: ID125 x OD133 x Length500~4000mm, Thickness: 8~13mm

* Planar/Rotary target can be customised as per your request.



Chemical Formula Purity Forms Specification

Si+Al 99.9% / 99.99% Planar / Rotary Customized

Ni+Cr 99.8% / 99.99% Planar Customized

Ti+Al 99.6% / 99.9% Planar Customized

Al+Sc 99.99% Planar Customized

In+Sn 99.99% Planar Customized

Al Alloy 99.99% / 99.999% / 99.9995% Planar Customized

Ag Alloy 99.99% / 99.995% Planar Customized

Au Alloy 99.99% / 99.999% Planar Customized

Cu Alloy 99.99% / 99.999% Planar Customized

Mo Alloy 99.95% Planar Customized

Ni Alloy 99.99% Planar Customized

Si Alloy 99.99% Planar / Rotary Customized

Alloy sputtering targets play a crucial role in thin film deposition processes, enabling the fabrication of coatings with specific properties tailored to the requirements of diverse applications in industries such as electronics, optics, and coatings.

If you need any information or a quote please contact us, you can contact our sales team directly or fill out the form below and we will get back to you in time.

Company Contact:

• Posted By: Fujian Acetron New Materials CO. , Ltd

• Phone: 15375906883

• Address: No.66 Zhanghu Rd, Zhang'gang Sub-Dist, Changle Dist, Fuzhou , Fujian , China

• Email:

• Website: https://www.acetron.net/

• Business Description: Fujian Acetron New Materials Co., Ltd, founded in 2002, is a comprehensive company integrated with R& D, manufacturing and selling of coating materials.
  
  Mainly engages in sputtering target, evaporation material and evaporation accessories for high precision optical lenses& Optical communication, semiconductors, LOW-E glass& Automotive glass, LCD displayer & Tablet touch screen and surface decoration.
  
  Our Products:
  
  - Planar Alloy Sputtering Target
  
  - Planar Ceramic Sputtering Target
  
  - Planar Metal Sputtering Targets
  
  - Rotary Metal Sputtering Targets
  
  - Rotary Ceramic Sputtering Target