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Tantalum Sputtering Target - China
price: check with company for price
ASTM B708 Standard Tantalum Sputtering Target, 99.95% 3N5 - 99.99% 4N Purity, Disc Target Chemical Compositions: Typical Analysis: Ta 99.95% 3N5 - 99.99%(4N) Metallic impurities, ppm max by weight Element Al Au Ag Bi B Ca Cl Cd Co Cr Cu Fe Content 0.2 1.0 1.0 1.0 0.1 0.1 1.0 1.0 0.05 0.25 0.75 0.4 Element Ga Ge Hf K Li Mg Na Mo Mn Nb Ni P Content 1.0 1.0 1.0 0.05 0.1 0.1 0.1 5.0 0.1 75 0.25 1.0 Element Pb S Si Sn Th Ti V W Zn Zr Y U Content 1.0 0.2 0.2 0.1 0.0 1.0 0.2 70.0 1.0 0.2 1.0 0.005 Non-Metallic impurities, ppm max by weight Element N H O C Content 100 15 150 100 Balance: Tantalum Other Specifications: Grain Size: Typical size<100μm Grain Size Other grain size available upon request Flatness: ≤0.2mm Surface Roughness: < Ra 1.6μm Surface： Polished Recystallization: 95%up Application: Coating materials for semiconductors, optics
Company Contact:
- Posted By: Baoji Towin Rare Metals Co., Ltd
- Phone: +8615814887696
- Address: No.1 workshop, Caijiapo Economic Development Zone, Baoji-qishan , Shaanxi , China
- Email:
- Website: http://www.baojitowin.com
Published date: November 7, 2018
- Business Description: We are manufacturing 3N5-4N tantalum ingot, tantalum plate, tantalum sheet, tantalum strip, tantalum foil, tantalum tube, tantalum rod, tantalum wire, tantalum sputtering targets, niobium ingot, niobium plate, niobium sheet, niobium strip, niobium foil, niobium tube, niobium wire, niobium rod, niobium sputtering target, niobium fabricated parts.
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