Rotary Metal Sputtering Targets - China

Rotary Metal Sputtering Targets

Excellent properties such as high purity, high density, high thermal conductivity, high stability, uniform grain, etc.

High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.

We have various purity levels to suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals.

Also have controlled specific impurities within the target

High density: Metal targets have high density characteristics, usually up to 99%, to ensure the stability and quality of materials.

Uniform grain: Controlled grain size and direction

Good composition uniformity: the component distribution is uniform, ensure the film formation rate is uniform, film quality.

Manufacturing processes

Manufacturing processes depend on the properties of the target material and its application.

We have (Vacuum melting, Rolling, Vacuum spraying, Atmospheric spraying, Vacuum hot pressing, Hot Isostatic Pressing (HIP), Cold Isostatic Pressing +Various atmosphere sintering technology, Low temperature metal, Vacuum hot pressing sintering technology, Electron beam melting, Zone melting purification, Vacuum directional solidification technology, etc).

For metal and alloy target, we adopt Vacuum melting, Rolling, Low temperature metal, Vacuum hot pressing sintering, Electron beam melting, Zone melting purification, Vacuum directional solidification technology.

Both Planar and Rotary target available

Planar target

Planar targets mainly refer to circular targets and rectangular targets with certain thickness.

The plane target material is connected with sputtering equipment by means of thread, the sputtering film layer is attached to the substrate under vacuum conditions, and then the film is processed by various methods to meet different needs.

Rotary target

Rotary target is a magnetically controlled target.

The target is shaped like a cylinder containing a stationary magnet for rotation.

Its advantage is high utilization rate, the disadvantage is high cost.

ACETRON is a comprehensive company integrated with R& D, manufacturing and selling of PVD coating materials, mainly engages in sputtering target, evaporation material and evaporation accessories for high precision optical lenses& Optical communication, semiconductors, LOW-E glass& Automotive glass, LCD display & touch panel and surface decoration.

Company Contact:

• Posted By: Fujian Acetron New Materials CO. , Ltd

• Phone: 15375906883

• Address: No.66 Zhanghu Rd, Zhang'gang Sub-Dist, Changle Dist, Fuzhou , Fujian , China

• Email:

• Website: https://www.acetron.net/

• Business Description: Fujian Acetron New Materials Co., Ltd, founded in 2002, is a comprehensive company integrated with R& D, manufacturing and selling of coating materials.
  
  Mainly engages in sputtering target, evaporation material and evaporation accessories for high precision optical lenses& Optical communication, semiconductors, LOW-E glass& Automotive glass, LCD displayer & Tablet touch screen and surface decoration.
  
  Our Products:
  
  - Planar Alloy Sputtering Target
  
  - Planar Ceramic Sputtering Target
  
  - Planar Metal Sputtering Targets
  
  - Rotary Metal Sputtering Targets
  
  - Rotary Ceramic Sputtering Target