ito sputtering targets Photos Catalog - page 3 - ECeurope Market
-
Desktop Singletarget Magnetron Sputtering Coater For Depositing AluminumLaboratory and scientific equipment - Zhengzhou CY Scientific Instrument Co., Ltd. - China - August 2, 2020 - contact company for priceCY-MSP180G-ALDC Desktop single sputter head magnetron sputtering coater (for depositing aluminum) This equipment is a desktop single sputter head magnetron sputtering coating machine. The miniaturized design of the equipment limits the appearance of ...
-
Magnetron Sputtering SourceIndustrial process machinery - Dongguan Dingshen Tech Co., Ltd. - China - September 12, 2023 - 7500.00 Dollar US$Features and Benefits Sputtering Width: 1200mm T-S distance: 80-100mm Brush Design: High-purity carbon brush, resistance less than 0.6 Ω, and more stable; Concentricity: Easy change of target with special design of the distal end of the cylindrical t...
-
Magnetron Sputtering Source Rotary TubeMachining and processing services - Dongguan Dingshen Tech Co., Ltd. - China - September 12, 2023 - 8000.00 Dollar US$Rotary magnetron source DST-FEBV1521550 Specifications Target size: ID125mm, OD152mm; Length 1550mm Electrode: M8 studs Cooling Water coupling connector for target: OD19 tower connector x 2pcs (1x in, 1x out) Motor: 200W Single Phase:220V, AC Motor(S...
-
Planar Magnetron Sputtering SourceMetal treatment machinery - Dongguan Dingshen Tech Co., Ltd. - China - September 12, 2023 - 15000.00 Dollar US$Planar magnetron source DST- PMEH100500-AS-AU Specifications Exterior Dimension: 640mmx290mm Target Material Size: 100x500x6mm Electrode: M8 studs Gas Distribution and Connectors: single section distribution, 1/4 inch male coupling connector x2pcs Ga...
-
Planar Alloy Sputtering TargetAdvertising - Fujian Acetron New Materials CO. , Ltd - China - March 27, 2024 - contact company for pricePlanar Alloy Sputtering Target Excellent properties such as high purity, high density, Good composition uniformity, Uniform grain, etc. High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.W...
-
Planar Ceramic Sputtering TargetAdvertising - Fujian Acetron New Materials CO. , Ltd - China - March 27, 2024 - contact company for pricePlanar Ceramic Sputtering Target Excellent properties such as high purity, high density, Good microstructure uniformity, excellent electrical properties. High purity: The metal target requires very high purity, to ensure the stability and reliability...
-
Rotary Ceramic Sputtering TargetAdvertising - Fujian Acetron New Materials CO. , Ltd - China - March 27, 2024 - contact company for priceRotary Ceramic Sputtering Target Excellent properties such as high purity, high density, Good microstructure uniformity, excellent electrical properties. High purity: The metal target requires very high purity, to ensure the stability and reliability...
-
Gr1 4n5 Titanium Sputtering TargetMinerals and ores and metals - Shaanxi Ruifuxiang Industry and Trade Co., Ltd - China - February 13, 2026 - contact company for priceTitanium-palladium alloys are mainly used in situations with extremely high corrosion resistance requirements, especially when dealing with corrosive media such as chlorides. They exhibit excellent performance in these applications. They are commonly...