Rotary Ceramic Sputtering Target - China

Rotary Ceramic Sputtering Target

Excellent properties such as high purity, high density, Good microstructure uniformity, excellent electrical properties.

High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.

We have various purity levels to suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals.

Also have controlled specific impurities within the target.

High density: Metal targets have high density characteristics, usually up to 95-99.5%, (ITO, NbOx can reach 99.5%) to ensure the stability and quality of materials.

High thermal conductivity: the thermal conductivity of the metal target is particularly high, which can be cooled quickly and improve the coating speed.

Microstructure uniformity: powder metallurgy process to ensure the overall uniformity of the target.

Excellent electrical properties: Reliable atmosphere sintering enables stable electrical conductivity of oxides with semiconductor characteristics.

* Maximum sizes of planar target

Thickness: 30mm (can be 60mm for round target)

Width: max 2000mm

Length: max 4000mm * Maximum sizes of rotary target

Vacuum/Air Spraying

Backing tubes: ID56 x OD64 x Length300~3000mm, Thickness: 3~5mm

Backing tubes: ID78~83 x OD89~92 x Length300~3000mm, Thickness: 3~7mm

Backing tubes: ID100 x OD108 x Length300~3000mm, Thickness: 3~8mm

Backing tubes: ID125 x OD133 x Length300~4000mm, Thickness: 3~13mm Bonding

Backing tubes: ID125 x OD133 x Length500~4000mm, Thickness: 8~13mm * Planar/Rotary target can be customised as per your request.

Chemical Formula Purity Forms Specification

SiO₂ 99.995% Planar Customized

Nb₂Ox 99.99% Planar / Rotary Customized

TiOx 99.99% Planar / Rotary Sputtering coating refers to the technology that the ions produced by the ion source are accelerated to gather in the vacuum to form a high speed ion beam, which bombards the solid surface, and the kinetic energy exchange between the ions and the solid surface atoms makes the atoms on the solid surface leave the solid and deposit on the surface of the substrate material.

The bombarded solid is the raw material for deposition of thin film materials by sputtering method, which is called the sputtering target.

If you need any information or a quote please contact us, you can contact our sales team directly or fill out the form below and we will get back to you in time.

Company Contact:

• Posted By: Fujian Acetron New Materials CO. , Ltd

• Phone: 15375906883

• Address: No.66 Zhanghu Rd, Zhang'gang Sub-Dist, Changle Dist, Fuzhou , Fujian , China

• Email:

• Website: https://www.acetron.net/

• Business Description: Fujian Acetron New Materials Co., Ltd, founded in 2002, is a comprehensive company integrated with R& D, manufacturing and selling of coating materials.
  
  Mainly engages in sputtering target, evaporation material and evaporation accessories for high precision optical lenses& Optical communication, semiconductors, LOW-E glass& Automotive glass, LCD displayer & Tablet touch screen and surface decoration.
  
  Our Products:
  
  - Planar Alloy Sputtering Target
  
  - Planar Ceramic Sputtering Target
  
  - Planar Metal Sputtering Targets
  
  - Rotary Metal Sputtering Targets
  
  - Rotary Ceramic Sputtering Target