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Plasma Etching Cleaner - China
price: contact company for price
The plasma etch process is the removal of certain material from another substrate surface to leave a desired pattern.
A mask helps prevent the material underneath from being etched.
In general, the process in the plasma etching system involves ion bombardment to remove material.
The process gas should be chosen so the rate of removal of the uncovered material is higher than the removal rate of the masking material.
This process is generally used in the semiconductor industries.
Plasma Etching Cleaner is a reactive ion etching device for semiconductor microfabrication dry etching.
It features a compact design, simple operation, and excellent process repeatability.
With the RIE plasma etching mode, it offers fast etching, high uniformity, high selectivity, and strong anisotropy.
Company Contact:
- Posted By: Shenzhen Naen Technology Co,. Ltd
- Phone: +86 181 6571 2881
- Address: Huaming City, Guangming District, Shenzhen , Guangdong , China
- Email:
- Website: https://www.cnplasma.com/
Published date: March 5, 2026
- Business Description: NaenTech was founded in 2010 and is headquartered in Shenzhen with a research and development branch in Hong Kong.
It is a high-tech company that focuses on the research and development, manufacturing, and sales of plasma material surface cleaning, vacuum coating technology, and high-end intelligent equipment.
Its main products currently include atmospheric/vacuum plasma cleaning machines, magnetron sputtering coating equipment, ion sputtering instruments, plasma etching equipment, plasma surface treatment equipment, and glow discharge devices.
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